| 摘要 |
PROBLEM TO BE SOLVED: To prevent a charged particle beam from deviating from its optical axis, irrespective of the direction (parallel or perpendicular to the optical axis) of a magnetic field applied to a sample, in an apparatus using a charged- particle-beam optical system which includes electron microscope. SOLUTION: The system is provided with a charged-particle-beam source, an irradiation optical system, the sample to be observed, a device which applies the magnetic field to the sample, an image-formation optical system and an image-observing and recording device; a first changed-particle beam deflection system and a second charged-particle beam deflection system are provided sequentially, along the advance direction of the charged particle beam between the illumination optical system and the sample; a third charged-particle beam deflection system and a fourth charged-particle-beam deflection system are provided in the similar manner between the sample and the image-formation optical system; and the deflection amount of the charged particle beam and its direction by the respective deflection systems, as well as the intensity and the direction of the magnetic field applied to the sample, are interlocked in accordance with a prescribed relation.
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