Composition photosensible pour planches lithographiques et procédé pour sa fabrication,申请号CH19670010612-传众专利搜索

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发明名称	Composition photosensible pour planches lithographiques et procédé pour sa fabrication
摘要
申请公布号	CH498421(A)	申请公布日期	1970.10.31
申请号	CH19670010612	申请日期	1967.07.26
申请人	SUMMER WILLIAMS, INC.	发明人	CHIEN HWANG,HO
分类号	G03F7/022;H01Q9/28;(IPC1-7):G03C1/52;G03F7/08	主分类号	G03F7/022
代理机构		代理人
主权项
地址

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