| 发明名称 |
ACIDIC COMPOSITION CONTAINING FLUORIDE FOR REMOVAL OF PHOTORESISTS AND ETCH RESIDUES |
| 摘要 |
<p>The present invention relates to compositions useful in removing photoresist and organic and inorganic residues and processes for removal of photoresists and etch residues. The compositions are aqueous, acidic compositions containing fluoride and organic polar solvents. The compositions are free of glycols and have a low surface tension and viscosity. Corrosion inhibitors are optionally present.</p> |
| 申请公布号 |
EP1066365(A4) |
申请公布日期 |
2002.10.09 |
| 申请号 |
EP20000904197 |
申请日期 |
2000.01.04 |
| 申请人 |
ASHLAND INC. |
发明人 |
PETERS, DARYL, W.;WARD, IRL, E. |
| 分类号 |
C11D3/00;C11D7/04;C11D7/10;C11D7/26;C11D7/30;C11D7/32;C11D7/50;C11D9/60;C11D11/00;G03F7/42;H01L21/027;H01L21/304;(IPC1-7):C11D9/04 |
主分类号 |
C11D3/00 |
| 代理机构 |
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