| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive material processor which performs processing without generating sensitivity variation caused by the temperature difference of a developer or difference in the flow velocity of the developer. SOLUTION: A spray pipe 51 is projected from a side wall 24B under a guide plate 46 arranged inside a developing tub 24 so that a jet-out port 110 can be turned toward a side plate 104 in the intermediate part of rack side plates 104 and 106, and a suction port 116 is provided close to a side wall 24B. Thus, the developer sucked from the suction port is jetted out toward the side plate 104 by operating a circulating pump, is turned to the upper surface side of the guide plate 46 by the side plate 104 and smoothly flows on the guide plate toward the side plate 106, the developer can be smoothly exchanged close to a PS plate passing on the guide plate, and no difference occurs in the flow velocity. |
