| 摘要 |
<p>1,217,757. Photo-lithography. FMC CORP. Nov. 19, 1968 [Jan. 8, 1968], No.54743/68. Heading G2M. A method of making a photo-lithographic deep etch printing plate comprises (1) applying to an oleophobic metal base a photo-curable composition coating comprising (a) a photo-curable allylic resin obtained by the polymerization of an addition polymerizable allyl carboxylic ester having a plurality of aliphatic ethylenically unsaturated linkages at least one of which is in an allyl ester group, the resin having residual unsaturation and being a solvent soluble material which is a solid at ambient temperature and which undergoes very little shrinkage when further polymerized by actinic radiation at ambient temperature, and (b) a sensitizing agent which upon absorbing actinic radiation at ambient temperature, accelerates polymerization of the polymer; (2) exposing the coating to a light pattern thereby forming a hardened photo-cured resist; (3) developing the coating to remove the unhardened portion thereof leaving the photo-cured resist; (4) etching the plate with a solution which dissolves the metal base not covered by the resist, and then copperizing the etched metal area; (5) removing the resist to expose the non-printing metal surface, and (6) desensitizing the non-printing surface. Preferably the base is Al, Zn or stainless steel, (a) and (b) are materials listed in Specification 1,217,719, and the desensitization is effected with asphaltum gum.</p> |
