发明名称 |
Exposure method, exposure apparatus and semiconductor manufacturing apparatus |
摘要 |
An exposure apparatus for exposing a photosensitive substrate to a pattern on a mask within an exposure view angle to transfer the pattern onto the photosensitive substrate using X-ray as exposure radiation, wherein exposure light on the mask is limited by a light blocking plate for blocking the exposure radiation, thus accomplishing efficient manufacturing of the semiconductor devices.
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申请公布号 |
US6463119(B1) |
申请公布日期 |
2002.10.08 |
申请号 |
US20000589812 |
申请日期 |
2000.06.09 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
TERASHIMA SHIGERU;MIYACHI TAKESHI;WATANABE YUTAKA;KASUMI KAZUYUKI |
分类号 |
H01L21/027;G03F7/20;(IPC1-7):G21K5/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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