发明名称 Double-sided wafer exposure method and device
摘要 A device for creating at least one aligned marking on opposite sides of a semiconductor wafer including a front side and a back side. A wafer receiving support unit including at least a first wafer receiving slot in a first side wall thereof receives a wafer inserted therein. A template positions at least one aligned marking on each of the front side of the semiconductor wafer and on the backside of the semiconductor wafer.
申请公布号 US6460265(B2) 申请公布日期 2002.10.08
申请号 US19980191720 申请日期 1998.11.12
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 POGGE H. BERNHARD;AUSSCHNITT CHRISTOPHER P.
分类号 G03F7/20;G03F9/00;(IPC1-7):G01B3/14 主分类号 G03F7/20
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