发明名称 |
Method and apparatus for continuous cleaning of substrate surfaces using ozone |
摘要 |
The present invention provides new and improved methods and apparatus for removing contamination from surfaces of substrates. Existing techniques include plasma ashing, glow discharge or UV/ozone processes. The present invention includes cleaning the substrate surfaces by transporting the substrates to be cleaned through a first zone where the substrates are heated preferably in a nitrogen atmosphere and then to a second zone where the substrates are surrounded by an atmosphere of ozone. The organic contamination is thereby vaporized into vapor products including CO, CO2 and H2O.
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申请公布号 |
US6461443(B1) |
申请公布日期 |
2002.10.08 |
申请号 |
US20000574889 |
申请日期 |
2000.05.19 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
AUDET JEAN;LEBOEUF MARIO;TREMBLAY ISABELLE;WOSSIDLO HERBERT P. R. |
分类号 |
H01L21/00;(IPC1-7):F23J1/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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