发明名称 |
System and method for determining stray light in a thermal processing system |
摘要 |
A system and method for determining the stray radiation within a heating chamber of a thermal processing apparatus. The stray radiation is determined by moving a generally unheated wafer vertically through the heating chamber, and measuring with a detector the amount of radiation reflected from the wafer at each vertical wafer position. The total measured radiation is then correlated with the stray radiation component of the total radiation.
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申请公布号 |
US6461036(B1) |
申请公布日期 |
2002.10.08 |
申请号 |
US19990413131 |
申请日期 |
1999.10.06 |
申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
SHAJII ALI;HEBB JEFFREY P. |
分类号 |
G01N21/27;F27B5/18;F27D21/00;G01J5/00;G01J5/02;G01J5/04;G01J5/10;H01L21/205;H01L21/26;H01L21/66;(IPC1-7):G01N25/00;G01J5/06;F27B3/12 |
主分类号 |
G01N21/27 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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