| 发明名称 |
Polymers, chemical amplification resist compositions and patterning process |
| 摘要 |
Polymers comprising fluorinated vinyl alcohol units and having acid labile groups partially introduced are novel. Using such polymers, resist compositions featuring transparency to excimer laser light and alkali solubility are obtained.
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| 申请公布号 |
US6461789(B1) |
申请公布日期 |
2002.10.08 |
| 申请号 |
US20000643969 |
申请日期 |
2000.08.23 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HATAKEYAMA JUN;WATANABE JUN;HARADA YUJI |
| 分类号 |
G03F7/004;G03F7/038;G03F7/039;(IPC1-7):G03F7/038 |
主分类号 |
G03F7/004 |
| 代理机构 |
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| 地址 |
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