发明名称 |
Plasma cleaning system for cavities, is integrated into component or plant and includes gas supply and extraction system with electrode producing plasma |
摘要 |
The plasma cleaning unit is integrated into the component or plant. A process gas supply (8) and extraction system is included for the cavity (2). Mounted in or on the cavity, an electrode (5) produces the plasma. The plasma cleaning unit is integrated into the component or plant. A process gas supply (8) and extraction system is included for the cavity (2). Mounted in or on the cavity, an electrode (5) produces the plasma. An Independent claim is included for a method cleaning a cavity in a machine component or plant. |
申请公布号 |
FR2822732(A1) |
申请公布日期 |
2002.10.04 |
申请号 |
FR20020003994 |
申请日期 |
2002.03.29 |
申请人 |
DIENER CHRISTOF |
发明人 |
DIENER CHRISTOF |
分类号 |
B08B7/00;C23C16/44;F04B37/14;F04D27/02;(IPC1-7):B08B7/00;C23F4/00;C23G3/00 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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