| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate-check system and a method for checking a substrate which reduces the distortion and contrast ununiformity of an observation image of a substrate surface. SOLUTION: The substrate-check system 100 is composed of a first optical system 1 for irradiating an electron beam 5 to the substrate 42 of an object to be checked, an electron detector 3 which detects a secondary electron emitted from the surface of the substrate 42 by receiving the irradiation of the electron beam 5 as a secondary electron and outputs the secondary electron as an image signal of an image showing a surface state of the substrate 42, a deflection means 41 which puts the electron beam 5 into the surface of the substrate 42 by deflecting it and advances a secondary beam 6 straight, a secondary optical system 2 which scales up the secondary beam 6 to image on the electron detector 3. Moreover, the system 100 is equipped with an electron gun 80 which irradiates an electron beam 75 to the substrate 42 before checking, and a mesh electrode 92 which is located between the electron gun 80 and the substrate 42 and to which a voltage Vm is applied to have potential energy above the energy of a secondary electron es mitted from the substrate 42.</p> |
