| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron ray source which enables to realize exposure transcribing with little indistinctness. SOLUTION: The electron ray source 1 comprises, a transparent substrate 2, a photoelectriccathode film 3 which is formed on the transparent substrate 2, an insulator mask film 4 which is formed no the photoelectriccathode film 3 and has a negative pattern of a transcribing pattern, and a focusing electrode mesh 3a which is formed on the mask film 4. The photoelectriccathode film 3 is made from, for example, gold, platinum, low work function materials, or semiconductor having small or negative electron affinity. The mask film 4 is made from, for example, amorphous insulator such as SiO2 , which has a short electron mean free path. The mask film 4 is provided with the focusing electrode mesh 3a which surrounds a sub field that is a region which is exposed together with electron rays. Paths of electrons which are emitted from the photoelectriccathode film 3 at wide angles are curved by a negative voltage which is applied to the focusing electrode mesh 3a, resulting in limiting of electron emitting angles.
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