| 摘要 |
PROBLEM TO BE SOLVED: To perform continuous treatment in a substrate treating apparatus normally by preventing inflow of residual gases in a treatment chamber into the other chambers. SOLUTION: In this substrate treating apparatus, at least two treatment chambers 4, 5 are connected to a common conveying chamber 3. Gate valves 9, 10 are arranged between the treatment chambers 4, 5 and the conveying chamber 3. When the substrate 20 is conveyed between the treatment chambers 4, 5 and the conveying chamber 3 by opening and closing the gate valves 9, 10, air pressure in each chamber 3 to 5 is set as follows. PAn >PB1 PB2 >PAm Where, PAn , PAm is the pressure in treatment chambers (n, m>=1, n≠m). PB1 , PB2 is the pressure in the conveying chamber. |
