发明名称 |
METHOD FOR PRODUCING GaN-BASED SEMICONDUCTOR CRYSTAL AND GaN-BASED SEMICONDUCTOR BASIC MATERIAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a high quality GaN-based crystal, and a GaN-based semiconductor basic material in which a high quality GaN- based crystal can be grown by that method. SOLUTION: Protrusions and recesses (or a level difference) 1a are formed on the surface of a crystal substrate 1 composed of a material different from a GaN-based semiconductor and a GaN-based crystal 2 is grown directly on the surface where protrusions and recesses are formed with no intermediary of a low temperature GaN-based buffer layer thus obtaining a GaN-based crystal layer 3. Lateral growth of the GaN-based crystal is suppressed by the protrusions and recesses (or a level difference) on the surface of the crystal substrate and the surface is planarized with no intermediary of the buffer layer. |
申请公布号 |
JP2002289540(A) |
申请公布日期 |
2002.10.04 |
申请号 |
JP20010091129 |
申请日期 |
2001.03.27 |
申请人 |
MITSUBISHI CABLE IND LTD |
发明人 |
TADATOMO KAZUYUKI;OKAGAWA HIROAKI |
分类号 |
H01L21/205;H01L33/06;H01L33/12;H01L33/16;H01L33/22;H01L33/32;H01S5/323;H01S5/343 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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