PROCESS FOR PRODUCING SEMICONDUCTOR SUBSTRATES AND SEMICONDUCTOR SUBSTRATES

摘要

PURPOSE: A process for producing semiconductor substrates and semiconductor substrates are provided to achieve an excellent chemical resistance with a high yield and an excellent production reliability without any development of cracks and any generation of foreign matters due to a projected portion of the coating film. CONSTITUTION: A coating film by coating an insulating film-forming coating liquid is formed on a substrate mounted on a rotating disc of a spin coater according to a spin coating method. A projected portion of the coating film formed at the periphery of the substrate is removed by ejecting a solvent through a nozzle moving from any point on a line drawn between the periphery edge and the center of the substrate toward the periphery edge while rotating the substrate.