发明名称 ELECTRON BEAM GENERATOR, DEVICE FOR LASER BEAM MACHINING AND MANUFACTURING METHOD THEREFOR
摘要 <p>PROBLEM TO BE SOLVED: To provide an electron beam generator which has a space profile like a top hat and uses a laser beam. SOLUTION: An optical diffraction element is disposed in an optical path of a laser beam which is emitted from a laser beam source. A laser beam which is diffracted by the optical diffraction element irradiates a photocathode. A plateau area of a distribution pattern of a power density in a diffracted image on the photocathode is larger than that of a distribution pattern of a power density in a cross section of the laser beam before entering the optical diffraction element.</p>
申请公布号 JP2002289127(A) 申请公布日期 2002.10.04
申请号 JP20010089185 申请日期 2001.03.27
申请人 SUMITOMO HEAVY IND LTD 发明人 TSUNEMI AKIRA
分类号 G02B5/18;B23K26/06;B23K26/073;H01J37/075;H01S3/00;(IPC1-7):H01J37/075 主分类号 G02B5/18
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