发明名称 NEUTRAL PARTICLE BEAM TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a neutral particle beam treatment device which can apply a large-bore beam to an object to be treated, with low-cost and compact constitution, and is hard to damage the object to be treated. SOLUTION: This neutral particle beam treatment device is equipped with a holder 20 which holds the object to be treated, a plasma generator which generates plasma within a vacuum chamber 3 by applying a high frequency electric field, an orifice electrode 4 which is arranged between the substance X to be treated and a plasma generator, a grid electrode 5, and a bipolar power source 102 which accelerates negative ions 6 from the generated plasma and passes them through the orifice 4a made in the orifice electrode 4 by applying voltage between the orifice electrode 4 as an anode and the grid electrode 5 during stoppage of a high-frequency electric field.
申请公布号 JP2002289581(A) 申请公布日期 2002.10.04
申请号 JP20010088859 申请日期 2001.03.26
申请人 EBARA CORP;UNIV TOHOKU 发明人 ICHIKI KATSUNORI;YAMAUCHI KAZUO;HIYAMA HIROKUNI;SAGAWA SEIJI
分类号 H05H1/46;C23C14/32;H01J37/32;H01L21/302;H01L21/3065;H01L21/31;H05H3/02 主分类号 H05H1/46
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