发明名称 METHOD FOR FORMING PATTERN BY LIFT-OFF METHOD APPLYING PHOTOCATALYST EFFECT
摘要 PROBLEM TO BE SOLVED: To greatly contribute to labor saving and low cost production and dramatically improve overall process yield by reducing the number of processes. SOLUTION: A method for forming a thin film comprises steps for: forming a pattern of a soluble metal film on a substrate having a light catalystic surface or on a substrate created by a light catalyst by applying a light catalytic effect; forming the thin film on which a pattern is scheduled to be formed; and forming a lift-off pattern by a solution removing the soluble metal film with the thin film created on it and on which the pattern is scheduled to be formed.
申请公布号 JP2002289499(A) 申请公布日期 2002.10.04
申请号 JP20010089084 申请日期 2001.03.27
申请人 NATIONAL INSTITUTE FOR MATERIALS SCIENCE;KAMEI MASAYUKI;MIHASHI TAKEFUMI 发明人 KAMEI MASAYUKI;MIHASHI TAKEFUMI
分类号 G03F7/004;C23C18/14;G02F1/1343;G03F7/26;H01L21/027;H01L21/306;H01L21/3205 主分类号 G03F7/004
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