发明名称 |
METHOD FOR FORMING PATTERN BY LIFT-OFF METHOD APPLYING PHOTOCATALYST EFFECT |
摘要 |
PROBLEM TO BE SOLVED: To greatly contribute to labor saving and low cost production and dramatically improve overall process yield by reducing the number of processes. SOLUTION: A method for forming a thin film comprises steps for: forming a pattern of a soluble metal film on a substrate having a light catalystic surface or on a substrate created by a light catalyst by applying a light catalytic effect; forming the thin film on which a pattern is scheduled to be formed; and forming a lift-off pattern by a solution removing the soluble metal film with the thin film created on it and on which the pattern is scheduled to be formed. |
申请公布号 |
JP2002289499(A) |
申请公布日期 |
2002.10.04 |
申请号 |
JP20010089084 |
申请日期 |
2001.03.27 |
申请人 |
NATIONAL INSTITUTE FOR MATERIALS SCIENCE;KAMEI MASAYUKI;MIHASHI TAKEFUMI |
发明人 |
KAMEI MASAYUKI;MIHASHI TAKEFUMI |
分类号 |
G03F7/004;C23C18/14;G02F1/1343;G03F7/26;H01L21/027;H01L21/306;H01L21/3205 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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