发明名称 DEVELOPER AND DEVELOPING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a developer for developing a photosensitive layer comprising a photosensitive material formed on a substrate capable of easily forming a desirable development pattern. SOLUTION: A light beam irradiating section 200 and a light beam receiving section 300 are arranged opposite so that a panel 600 can be interposed. For the test development of a substrate 601 on which a photosensitive layer 602 is formed, a laser beam is irradiated from the light beam irradiating section 200, and the optical power of transmitted light beam filtering out the panel 600 is measured with time by the light beam receiving section 300, to enable the determination of a completion time of the development to easily optimize a development time in a succeeding production development.
申请公布号 JP2002289498(A) 申请公布日期 2002.10.04
申请号 JP20010086458 申请日期 2001.03.23
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 SUMITA KEISUKE;YASUI HIDEAKI;SUGIMOTO KAZUHIKO;TANAKA HIROYOSHI
分类号 G03F7/30;G03D3/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/30
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