METHOD FOR EVALUATING SEMICONDUCTOR WAFER AND ITS EVALUATION APPARATUS

摘要

PROBLEM TO BE SOLVED: To make it possible to grasp a precise contaminated state of a wafer surrounding portion which is difficult to be grasped without leakage of chemical liquid, such as acid. SOLUTION: The evaluation apparatus evaluates the cleanability of a semiconductor wafer 10 by contacting the semiconductor wafer 10 with a solution and recovering and analyzing the solution. The apparatus comprises a container 1 for containing the solution and a retaining means 2 for retaining the semiconductor wafer 10. The solution-containing portion of the container is a channel intowhich at least a part of the surrounding portion of the semiconductor wafer 10 can be inserted and the channel is provided with a movement prevention means for preventing the movement of the solution contained inside the channel.