| 摘要 |
PROBLEM TO BE SOLVED: To provide a neutral beam treatment device which can apply a large- bore beam to a substance to be treated with low-cost and compact constitution, and enables processing such as highly accurate etching, film growth, etc. without damaging the substance to be treated. SOLUTION: This neutral particle beam treatment device is equipped with a treatment gas introduction port 11 which leads in treatment gas into a vacuum chamber, a plasma generation chamber 2 which generates positive ions and electrons from the led in treatment gas, a negative gas generation chamber 3 which generates negative ions by electrons generated in the plasma generation chamber 2 adhering to remaining gas, an ion extraction means 4 which draws out the above positive ions or negative ions and accelerates them in specified direction, and a neutralizing means 5 which forms a neutral particle beam by neutralizing the ion beam generated by the ion extraction means. This applies the neutral particle beam generated by the neutralizing means 5 to the substance X to be treated. |
