METHOD AND DEVICE FOR EXFOLIATING RESIST

摘要

PROBLEM TO BE SOLVED: To provide a resist exfoliation method which simplifies the process of exfoliating resist, a resist exfoliation method which performs the cleaning of a base layer at the same time with the exfoliation of the resist, and a resist exfoliator for materializing these methods. SOLUTION: Atomic hydrogen is generated by the catalytic cracking reaction between a heated high fusing point catalyst and exfoliating gas including molecules having hydrogen atoms, and the generated atomic hydrogen and the resist are brought into contact with each other to exfoliate the resist in a gaseous phase manner.