发明名称 |
System and method for performing optical inspection utilizing diffracted light |
摘要 |
A system and method for performing optical inspection of structures on the surface of a semiconductor wafer. The wafer surface is illuminated with a polychromatic light source. A multiple-charged couple-device (CCD) camera is positioned to capture light diffracted by the structures on the wafer surface at the first order of diffraction. The captured light is then separated into a plurality of component wavelengths which are directed onto the CCDs. A digital filter creates a plurality of digitized diffractive images of the wafer surface at different component wavelengths. The diffractive images may be integrated and analyzed to detect defects in the structures, or may be analyzed individually. An image at a particular wavelength may be selected and analyzed by using the known grating pitch of the structures to calculate the wavelength.
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申请公布号 |
US2002140930(A1) |
申请公布日期 |
2002.10.03 |
申请号 |
US20020094119 |
申请日期 |
2002.03.08 |
申请人 |
LIN YOULIN;HENNESSEY A. KATHLEEN;LIU YONGQIANG;FU YONGHANG;YAMASHITA MASAMI;SHIMOMURA ICHIRO |
发明人 |
LIN YOULIN;HENNESSEY A. KATHLEEN;LIU YONGQIANG;FU YONGHANG;YAMASHITA MASAMI;SHIMOMURA ICHIRO |
分类号 |
G01N21/95;(IPC1-7):G01N21/88 |
主分类号 |
G01N21/95 |
代理机构 |
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