PHASE SHIFTING MASK FOR MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE MASK

摘要

PROBLEM TO BE SOLVED: To provide a phase shifting mask for manufacturing a semiconductor device and to provide a method for manufacturing the mask. SOLUTION: The phase shifting mask comprises a transparent substrate 100, a main pattern 130a composed of a first phase shifting layer 110a formed on the transparent substrate 100 and having first optical transmittance greater than 0, and at least one assistant pattern 140 which is formed around the main pattern 130a on the transparent substrate for phase-shifting by the same degree as the main pattern 130a but is not transferred to a wafer during exposure, and which is less than the first optical transmittance.