发明名称 Optical semiconductor device and fabricating method thereof
摘要 An optical semiconductor device having a low threshold current and easiness of a single transverse mode oscillation is provided. The optical semiconductor device has a low device parasitic capacitance that allows a direct modulation at high speed. The optical semiconductor device comprises a first conduction type substrate, a stripe shaped active layer formed on the first conduction type substrate, a mesa shaped burying layer formed around the active layer and having a larger band gap than that of the active layer, and a groove that electrically isolates the burying layer, wherein the section of the burying layer is in an inverse trapezoid shape of which the upper base side is longer than the lower base side.
申请公布号 US2002139989(A1) 申请公布日期 2002.10.03
申请号 US20020104634 申请日期 2002.03.21
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 MATSUYAMA TAKAYUKI
分类号 H01S5/042;H01S5/22;H01S5/227;H01S5/343;(IPC1-7):H01S5/00;H01L21/00;H01L33/00 主分类号 H01S5/042
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