发明名称 Method and configuration for conditioning a polishing pad surface
摘要 A method and a configuration for conditioning a polishing pad surface are described. The method includes measuring a rotation table current or voltage as an input for a motor driving the rotation of the polishing pad versus a rotating conditioning head. The electrical power input is used as a measure of an actual abrasion effective in regenerating the polishing pad. Since the polishing pad commonly deteriorates by repeated usage, i.e. debris settles down onto its surface, the abrasion efficiency decreases. The method issues a warning signal, in response to the electrical power input exceeding a limit, to take actions for maintaining the uniformity of the conditioning process. The polishing pad rotation can be accelerated or the conditioning head pressure force or rotation can be increased in response to the warning signal. Therefore, the polishing pad can be conditioned.
申请公布号 US2002142706(A1) 申请公布日期 2002.10.03
申请号 US20020114773 申请日期 2002.04.02
申请人 GLASHAUSER WALTER;UTESS BENNO;PURATH ANDREAS 发明人 GLASHAUSER WALTER;UTESS BENNO;PURATH ANDREAS
分类号 B24B37/04;B24B49/16;B24B53/007;H01L21/304;(IPC1-7):B24B1/00;B24B55/00 主分类号 B24B37/04
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