发明名称 |
Inspection system, inspection apparatus, inspection program, and production method of semiconductor devices |
摘要 |
In the wafer production process of a semiconductor integrated circuit, an inspection system and an inspection apparatus that convert and output a yield loss at high accuracy from the result of a defect inspection, such as a dark-field inspection and a bright-field inspection without waiting for the result of the final probing test. Defect map data read processing and kill ratio computation data read processing are performed. Subsequently, kill ratio computation processing every defect computes a kill ratio every defect using defect map data and kill ratio computation data. Subsequently, kill ratio computation processing every chip computes a kill ratio every LSI chip using the kill ratio every defect. Subsequently, yield loss computation processing computes a yield loss of the defect map data using the kill ratio every chip and yield loss output processing outputs the computation result.
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申请公布号 |
US2002143483(A1) |
申请公布日期 |
2002.10.03 |
申请号 |
US20020079518 |
申请日期 |
2002.02.22 |
申请人 |
HITACHI, LTD. |
发明人 |
ONO MAKOTO;IWATA HISAFUMI |
分类号 |
G01N21/956;G01N37/00;H01L21/00;H01L21/66;(IPC1-7):G06F19/00 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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