发明名称 Method for growing single crystal of compound semiconductor and substrate cut out therefrom
摘要 A method for growing a compound semiconductor single crystal comprising cooling a starting material melt of a compound semiconductor with an upward increasing temperature gradient in a crystal-growing container having a seed crystal placed at a lower end, thereby growing a single crystal upward from the seed crystal, the crystal orientation of the seed crystal in a crystal growth axis direction being an offset orientation of <100>+theta, wherein the offset angle theta is 2°<=theta<=55°.
申请公布号 US2002139296(A1) 申请公布日期 2002.10.03
申请号 US20020112700 申请日期 2002.04.02
申请人 HITACHI CABLE LIMITED 发明人 OHNISHI MASAYA;ITANI KENYA;MIZUNIWA SEIJI;SASABE HIROSHI;FUJISAKI INAO
分类号 C30B11/00;C30B11/14;C30B29/42;H01L21/208;(IPC1-7):C30B9/00;C30B17/00;C30B21/02;C30B28/06 主分类号 C30B11/00
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