发明名称 Structure for reducing leakage current in submicron IC devices
摘要 A technique for reducing leakage current in static CMOS devices by adding additional transistors in series between selected inverters or logic gates and ground or power. NMOS and PMOS transistors are added to selected buffers comprised of two inverters in series. The PMOS transistor is connected between the first inverter and power and the NMOS transistor is connected between the second inverter and ground. The added transistors are controlled by a memory cell to be on when the buffer is being used and off when the buffer is unused. Alternatively, no PMOS transistor is added and an existing PMOS transistor of the first inverter is manufactured to sit in a Vgg well. The same techniques are employed with selected buffer pairs and logic gates.
申请公布号 US2002141234(A1) 申请公布日期 2002.10.03
申请号 US20010825224 申请日期 2001.04.02
申请人 KAVIANI ALIREZA S. 发明人 KAVIANI ALIREZA S.
分类号 H01L21/822;H01L21/82;H01L21/8238;H01L27/04;H01L27/092;H03K19/00;H03K19/0175;H03K19/173;H03K19/177;(IPC1-7):G11C11/34;H01L27/10 主分类号 H01L21/822
代理机构 代理人
主权项
地址