| 发明名称 |
Extreme ultraviolet mask with improved absorber |
| 摘要 |
The present invention discloses an EUV mask having an improved absorber layer with a certain thickness that is formed from a metal and a nonmetal in which the ratio of the metal to the nonmetal changes through the thickness of the improved absorber layer and a method of forming such an EUV mask.
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| 申请公布号 |
US2002142230(A1) |
申请公布日期 |
2002.10.03 |
| 申请号 |
US20010823641 |
申请日期 |
2001.03.30 |
| 申请人 |
YAN PEI-YANG;ZHANG GUOJING |
发明人 |
YAN PEI-YANG;ZHANG GUOJING |
| 分类号 |
G03F1/08;G03F1/14;(IPC1-7):G03F9/00;G21K5/00;G03C5/00 |
主分类号 |
G03F1/08 |
| 代理机构 |
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