NEGATIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN BY USING THE SAME

摘要

PROBLEM TO BE SOLVED: To improve the sensitivity and resolution of a chemically amplifying negative resist and to impart excellent post exposure delay property to the resist. SOLUTION: The negative resist composition contains (A) copolymers of alkali-soluble hydroxyl styrene and styrene, (B) halogen-containing triazine compounds which generate acids by irradiation of radiation and (C) at least one kind of crosslinking agent selected from melamine resin and urea resin in which the N-site atoms are substituted with methylol groups or alkoxy methyl groups or both of the groups.