发明名称 EUV, XUV, and X-ray wavelength sources created from laser plasma produced from liquid metal solutions, and nano-size particles in solutions
摘要 Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form a point source EUV, XUV and x-ray source. Various types of liquid droplet targets include metallic solutions, and nano-sized particles in solutions having a melting temperature lower than the melting temperature of some or all of the constituent metals, used a laser point source target droplets. The solutions have no damaging debris and can produce plasma emissions in the X-rays, XUV, and EUV (extreme ultra violet) spectral ranges of approximately 0.1 nm to approximately 100 nm, approximately 11.7 nm and 13 nm, approximately 0.5 nm to approximately 1.5 nm, and approximately 2.3 nm to approximately 4.5 nm. The second type of target consists of various types of liquids which contain as a miscible fluid various nano-size particles of different types of metals and non-metal materials.
申请公布号 US2002141536(A1) 申请公布日期 2002.10.03
申请号 US20010082658 申请日期 2001.10.19
申请人 RICHARDSON MARTIN 发明人 RICHARDSON MARTIN
分类号 H05H1/24;H01L21/027;H05G2/00;(IPC1-7):H05H1/00;G21G4/00;H01J35/00 主分类号 H05H1/24
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