| 摘要 |
An exposure apparatus includes a light source, one or two or more housings each for accommodating therein an optical element disposed along an exposure light path extending from the light source to a substrate, a first substitution system for substituting the interior of the housing with an inert gas ambience, and a second substitution system for substituting the interior of a holding mechanism for holding the optical element accommodated in the housing, with an inert gas ambience. The structure enables reduction in time for substitution of the exposure light path with an inert gas, and assures enlargement of a throughput of the exposure apparatus.
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