Plasma controlled antenna

摘要

An improved plasma controlled millimeter wave (MMW) or microwave (muW) antenna is provided. A plasma of electrons and holes is photo-injected into a photoconducting wafer. A special distribution of plasma and a MMW/muW reflecting surface behind the wafer allows the antenna to be generated at low light intensities and a 180° phase shift (modulo 360°) to be applied to selected MMWs/muWs.