CHEMICALLY AMPLIFYING POSITIVE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a chemically amplifying positive resist composition excellent in sensitivity and resolution and improved in the problem of scum. SOLUTION: The chemically amplifying positive resist composition contains the following resin, a radiation-sensitive acid producing agent and polypropylene glycol. The resin has polymer units derived from hydroxylstyrene and polymer units derived from 2-ethyl-2-adamantyl (meth)acrylates and the resin itself is insoluble or hardly soluble with an alkali aqueous solution but becomes soluble with an alkali aqueous solution after groups unstable to acids are separated by the effect of acids.