发明名称 APPARATUS FOR RESIN SEALING OF SEMICONDUCTOR WAFER, MOLD FOR MANUFACTURING SEMICONDUCTOR DEVICE, GATE APPARATUS FOR RESIN SEALING OF SURFACE OF SEMICONDUCTOR WAFER, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR WAFER FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To reduce the damage to a semiconductor wafer to the utmost by reducing the force applied to the semiconductor wafer to the utmost in a process for mounting the semiconductor wafer in a mold to seal the surface of the wafer with a resin. SOLUTION: An impact relaxing means for reducing the force applied to the semiconductor wafer is provided under a lower mold.</p>
申请公布号 JP2002283388(A) 申请公布日期 2002.10.03
申请号 JP20010089851 申请日期 2001.03.27
申请人 OKI ELECTRIC IND CO LTD 发明人 MATSUMOTO JIRO
分类号 B29C45/26;B29C45/02;B29C45/14;B29C45/37;H01L21/00;H01L21/56;H01L23/12;(IPC1-7):B29C45/14 主分类号 B29C45/26
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