发明名称 |
SEMICONDUCTIVE BELT AND METHOD OF MANUFACTURING FOR THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductive belt which has high mechanical characteristics in spite of use for an image forming device and has the decreased intra-surface variations of resistance, the lessened degradation in resistance by an electrical load or lapse of time, good shape accuracy and lower surface friction resistance. SOLUTION: This semiconductive belt consists of a polyimide resin containing carbon black and the surface roughness Ra of the outer peripheral surface of the belt is <=0.5μm and its coefficient of surface dynamic friction is <=0.8. This method of manufacturing the semiconductive belt includes a process step of supplying a polyamide acid solution uniformly dispersed with the carbon black to the inside surface of a cylindrical metal mold having the surface roughness Ra of <=1.0μm and forming a film by rotating the cylindrical metal mold in its axial direction, a process step of peeling the cured film until the film can support itself by heating the metal mold and removing the solvent and a process step of replacing the peeled film to the outside surface of a metallic cylinder having the surface roughness Ra of 0.2 to 3.0μm and heating the film together with the cylinder to effect the imide conversion thereof.
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申请公布号 |
JP2002287528(A) |
申请公布日期 |
2002.10.03 |
申请号 |
JP20010089993 |
申请日期 |
2001.03.27 |
申请人 |
NITTO DENKO CORP |
发明人 |
ISHIZAKI SATORU;TOMITA TOSHIHIKO;IWAMOTO TOSHIAKI |
分类号 |
G03G15/16;B29C41/10;B29C41/42;C08J5/18;C08K3/04;C08L79/08;G03G15/20;G03G15/24;(IPC1-7):G03G15/16 |
主分类号 |
G03G15/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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