| 摘要 |
<p>A sputtering target material which comprises an Ag alloy comprising Ag, a specific small amount of a metal component (A) selected from among In, Sn and Zn and a specific small amount of a metal component (B) selected from among Au, Pd and Pt and optionally a small amount of Cu. The sputtering target material has a high reflectance and also exhibits excellent resistance to sulfurization.</p> |
