发明名称 |
ACTIVE COMPONENT AND PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high sensitivity and capable of forming a high resolution pattern. SOLUTION: The photosensitive resin composition is obtained by combining an active metal alkoxide of the formula (X)m-n -M<m> -[(U1 )p -(U2 -Z)t ]n or its polycondensation product and an active component selected from particles of the formula P-[(Y)s - (U<1> )p -(U2 -Z)t }]k with a photosensitive agent. In the formulae, X is H, halogen, alkoxy or alkoxycarbonyl; M is a metal atom whose valence (m) is >=2; U1 is a first linking unit; U2 is a second linking unit; Z is a group which produces a solubility difference owing to irradiation with light; P is a fine particulate carrier; Y is a coupling residue; (n) is an integer of >=1; m>n; (p) is 0 or 1; (t) is 1 or 2; (k) is an integer of >=1; and (s) is 0 or 1. |
申请公布号 |
JP2002287339(A) |
申请公布日期 |
2002.10.03 |
申请号 |
JP20010370476 |
申请日期 |
2001.12.04 |
申请人 |
KANSAI RESEARCH INSTITUTE |
发明人 |
HANABATAKE MAKOTO;SATO MASAHIRO;KATAYAMA JUNKO;KITAJIMA SATSUKI |
分类号 |
G03F7/004;G03F7/039;G03F7/075;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|