发明名称 |
Photopolymerizable composition for short wavelenght semiconductor laser exposure, photosensitive composition and method for polymerizing photosensitive composition |
摘要 |
<p>Disclosed is a photopolymerizable composition which comprises (i) a sensitizing dye represented by the following formula (I-1), (ii) a titanocene compound, and (iii) an addition polymerizable compound having at least one ethylenically unsaturated double bond: <CHEM> wherein A and B each represents -S-, NR3, or NR4; R3 and R4 each represents a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group; Y1 and Y2 each represents a non-metallic atomic group to form a basic nucleus of a dye together with the adjacent A or B, and the adjacent carbon atoms; R1 and R2 each represents a monovalent non-metallic atomic group, or they may be bonded to each other to form an aliphatic or aromatic ring.</p> |
申请公布号 |
EP1048982(B1) |
申请公布日期 |
2002.10.02 |
申请号 |
EP20000109033 |
申请日期 |
2000.04.27 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
MUROTA, YASUFUMI;SORORI, TADAHIRO |
分类号 |
C08F2/50;G03F7/029;G03F7/031;(IPC1-7):G03F7/029 |
主分类号 |
C08F2/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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