| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus efficiently recovering processing liquid splashing from a rotary base or an atmosphere shield plate and preventing splash. SOLUTION: A substrate W is held in a horizontal attitude on a spin base 10 through a chuck pin 14. The atmosphere shield plate 30 is provided above the spin base 10. While the atmosphere shield plate 30 is brought closer to the substrate W and the substrate W is rotated, the processing liquid and gaseous nitrogen, etc., are supplied from the lower surface and the processings of washing and drying, etc., are performed. The processing liquid splashing from the substrate W is recovered by the recovery port 57 of a splash guard 50. Liquid chemicals flowing on the spin base 10 splash from a guide part 60. Since the guide part 60 is provided with a surface 62 to be flat with the upper surface 10a of the spin base 10 and is provided with a sharp end part 61 in a sharp shape facing the recovery port 57, the liquid chemicals splashing from the spin base 10 accurately go to the recovery port 57.
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