| 摘要 |
A method is provided for fabricating precision x-ray collimators including precision focusing x-ray collimators. Fabricating precision x-ray collimators includes the steps of using a substrate that is electrically conductive or coating a substrate with a layer of electrically conductive material, such as a metal. Then the substrate is coated with layer of x-ray resist. An intense radiation source, such as a synchrotron radiation source, is utilized for exposing the layer of x-ray resist with a pattern of x-ray. The pattern delineates a grid of apertures to collimate the x-rays. Exposed parts of the x-ray resist are removed. Regions of the removed x-ray resist are electroplated. Then remaining resist is optionally removed from the substrate. When exposing the layer of x-ray resist with a pattern of x-ray for non-focusing collimators, the substrate is maintained perpendicular to impinging x-rays from the synchrotron radiation source; and the substrate is scanned vertically. For precision focusing x-ray collimators, the substrate is scanned vertically in the z-direction while varying the angle of inclination of the substrate in a controlled way as a function of the position of the z-direction during the scan.
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