发明名称 Fluorinated aromatic acetal polymers and photosensitive compositions containing such polymers
摘要 A novel fluorinated aromatic acetal polymer comprises at least one unit of A and at least one unit of B or C, or at least one unit of each of A, B and C and optionally further comprises at least one unit of either D or E or at least one unit of each of D and E, wherein the units A and B and/or C, and optionally D and/or E are linked together by single covalent C-C bonds and have the formulae:wherein RA is H or C1-C11 alky, or an aryl group that does not contain fluorine, and RB and RC are an aryl groups that contain fluorine. The polymer is prepared by reacting a hydrolyzed polyvinyl acetate polymer or copolymer with at least one non-fluorinated aldehyde component, and at least one fluorinated aromatic component. The polymer is useful is preparing a photosensitive composition which comprises at least one diazo resin and at least one such fluorinated aromatic acetal polymer. Such a photosensitive composition may be applied to a support to form an imageable member which may be imaged to form a lithographic printing plates.p
申请公布号 US6458503(B1) 申请公布日期 2002.10.01
申请号 US20010801538 申请日期 2001.03.08
申请人 KODAK POLYCHROME GRAPHICS LLC 发明人 PLATZER STEPHAN;PERRON PAUL;ALDEN MELINDA
分类号 C08F8/18;G03F7/004;G03F7/021;(IPC1-7):G03F7/021;C08F8/00 主分类号 C08F8/18
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