System and method for facilitating determining suitable material layer thickness in a semiconductor device fabrication process

摘要

The present invention relates to a test wafer for use in optimizing a process. The test wafer includes a substrate and a material layer formed over the substrate, wherein the material layer includes N number of test regions (N being an integer greater than one). At least one of the test regions has a material layer thickness different from another of the test regions. A spindle drive system is also provided for driving at least one spindle. One end of the at least one spindle is coupled to a polishing pad, which is employed in forming the test regions.