发明名称 |
Photoresist stripper composition and method for stripping photoresist using the same |
摘要 |
A photoresist stripper composition is formed of a mixture of acetone, gamma-butyrolactone, and ester solvent. A photoresist stripping method includes spraying the photoresist stripper composition over a substrate while rotating the substrate at a relatively low speed, so as to strip photoresist from the substrate. The rotation of the substrate is stopped for a short period of time, and thereafter the photoresist stripper composition is again sprayed over the substrate while rotating the substrate at a relatively high speed. Then, the substrate is rinsed with pure water.
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申请公布号 |
US6458518(B1) |
申请公布日期 |
2002.10.01 |
申请号 |
US20020045062 |
申请日期 |
2002.01.15 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
MOON SANG-SIK;JEON MI-SOOK;JUN PIL-KWON;KIL JUNE-ING;PARK JE-EUNG;CHUN SANG-MUN |
分类号 |
G03F7/32;B08B3/02;B08B3/08;C11D7/50;C11D11/00;G03F7/30;G03F7/42;H01L21/027;H01L21/311;(IPC1-7):G03F7/42 |
主分类号 |
G03F7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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