发明名称 Method of forming diamond film and film-forming apparatus
摘要 A method and an apparatus form a diamond film from a microwave plasma by controlling a manufacturing condition based on a spectroscopic measurement of the plasma light emission to obtain a large area of a high-quality diamond film. In the method of forming a diamond film, a gas mixture of hydrocarbon gas and hydrogen gas is introduced into a reactor, where the gas mixture is excited by microwave energy which is also introduced into the reactor to generate a plasma, and the light emitted from the plasma is spectroscopically measured. Furthermore, a formation condition of the diamond film is controlled such that the spectrum of a carbon molecule (C2) falls within a predetermined range of requirement. A carbon molecule vibration temperature is determined from the spectrum, and the formation pressure, or the gas flow rate is controlled so that the determined vibration temperature falls within a specified range, especially 2000 to 2800 K.
申请公布号 US6458415(B2) 申请公布日期 2002.10.01
申请号 US20010873620 申请日期 2001.06.04
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 MEGURO KIICHI;MATSUURA TAKASHI;IMAI TAKAHIRO
分类号 C30B29/04;C23C16/27;C23C16/511;C23C16/52;C30B25/02;(IPC1-7):C23C16/26;H05H1/46 主分类号 C30B29/04
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