发明名称 VACUUM SYSTEM FOR SEMICONDUCTOR FABRICATION
摘要 PURPOSE: A vacuum system for semiconductor fabrication is provided to prevent a counter current phenomenon of fluid generated from a state of turning-off of a vacuum pump by using a counter current cutoff valve. CONSTITUTION: An exhaust line(20) is connected with semiconductor fabrication equipment(10). A vacuum pump(30) is used for discharging fluid from the semiconductor fabrication equipment(10) to the exhaust line(20). A counter current cutoff valve(40) is installed in the exhaust line(20). The counter current cutoff valve(40) is operated by a pressure of fluid transferred from the vacuum pump(30) and the exhaust line(20) is closed by the counter current cutoff valve(40) when the vacuum pump(30) is changed a state of turning-on to a state of turning-off. The exhaust line(20) is opened by the counter current cutoff valve(40) when the vacuum pump(30) is in the state of turning-on.
申请公布号 KR20020073817(A) 申请公布日期 2002.09.28
申请号 KR20010013680 申请日期 2001.03.16
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SHIN, BONG JU
分类号 H01L21/00;(IPC1-7):H01L21/00 主分类号 H01L21/00
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