发明名称 |
VACUUM SYSTEM FOR SEMICONDUCTOR FABRICATION |
摘要 |
PURPOSE: A vacuum system for semiconductor fabrication is provided to prevent a counter current phenomenon of fluid generated from a state of turning-off of a vacuum pump by using a counter current cutoff valve. CONSTITUTION: An exhaust line(20) is connected with semiconductor fabrication equipment(10). A vacuum pump(30) is used for discharging fluid from the semiconductor fabrication equipment(10) to the exhaust line(20). A counter current cutoff valve(40) is installed in the exhaust line(20). The counter current cutoff valve(40) is operated by a pressure of fluid transferred from the vacuum pump(30) and the exhaust line(20) is closed by the counter current cutoff valve(40) when the vacuum pump(30) is changed a state of turning-on to a state of turning-off. The exhaust line(20) is opened by the counter current cutoff valve(40) when the vacuum pump(30) is in the state of turning-on.
|
申请公布号 |
KR20020073817(A) |
申请公布日期 |
2002.09.28 |
申请号 |
KR20010013680 |
申请日期 |
2001.03.16 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SHIN, BONG JU |
分类号 |
H01L21/00;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|