发明名称 STRUCTURE OF FLASH MEMORY DEVICE
摘要 PURPOSE: A structure of flash memory devices is provided to prevent a short between unit cells by preventing a poly bridge and a poly ribbon due to moat. CONSTITUTION: Memory cell array comprises a plurality of bit lines(52) and a plurality of word lines(53) arranged vertically to the bit lines. A first active region(42a) is formed at bottom of the bit lines(52) and parallel with the bit lines(52). A unit cell(B) is formed at the first active region(42a) of portions to cross the bit lines(52) and the word lines(53), and includes a gate stacked a floating gate(44) and a control gate. Adjacent two unit cells(B) are connected to the bit lines(52) via a bit line contact(50), and drain regions of the unit cells are isolated via an STI(Shallow Trench Isolation) field oxide(51a).
申请公布号 KR20020073641(A) 申请公布日期 2002.09.28
申请号 KR20010013361 申请日期 2001.03.15
申请人 HYNIX SEMICONDUCTOR INC. 发明人 JUNG, JIN HUI;KANG, CHUN SU
分类号 H01L29/788;(IPC1-7):H01L29/788 主分类号 H01L29/788
代理机构 代理人
主权项
地址