发明名称 |
STRUCTURE OF FLASH MEMORY DEVICE |
摘要 |
PURPOSE: A structure of flash memory devices is provided to prevent a short between unit cells by preventing a poly bridge and a poly ribbon due to moat. CONSTITUTION: Memory cell array comprises a plurality of bit lines(52) and a plurality of word lines(53) arranged vertically to the bit lines. A first active region(42a) is formed at bottom of the bit lines(52) and parallel with the bit lines(52). A unit cell(B) is formed at the first active region(42a) of portions to cross the bit lines(52) and the word lines(53), and includes a gate stacked a floating gate(44) and a control gate. Adjacent two unit cells(B) are connected to the bit lines(52) via a bit line contact(50), and drain regions of the unit cells are isolated via an STI(Shallow Trench Isolation) field oxide(51a).
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申请公布号 |
KR20020073641(A) |
申请公布日期 |
2002.09.28 |
申请号 |
KR20010013361 |
申请日期 |
2001.03.15 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
JUNG, JIN HUI;KANG, CHUN SU |
分类号 |
H01L29/788;(IPC1-7):H01L29/788 |
主分类号 |
H01L29/788 |
代理机构 |
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