发明名称 |
SURFACE LIGHT EMITTING SEMICONDUCTOR LASER |
摘要 |
PROBLEM TO BE SOLVED: To provide a surface light emitting semiconductor layer having structure where band structure is not disturbed near a spacer layer even if an etching stop layer not only for wet etching but also for forming the height of mesa with good controllability in the surface light emitting semiconductor laser formed on a semiconductor substrate such as a GaAs substrate. SOLUTION: A layer 6b which is selected and oxidized and which functions as a current narrowing part is disposed in upper DBR 6. A layer including In and P is arranged in a position which is not adjacent to a first spacer layer 3 in lower DBR 2 as an etching stop layer 2a at the time of etching into a mesa shape.
|
申请公布号 |
JP2002280666(A) |
申请公布日期 |
2002.09.27 |
申请号 |
JP20010083229 |
申请日期 |
2001.03.22 |
申请人 |
RICOH CO LTD |
发明人 |
UENISHI MORIMASA;SATO SHUNICHI;TAKAHASHI TAKASHI;JIKUTANI NAOTO;ITO AKIHIRO |
分类号 |
H01S5/183;(IPC1-7):H01S5/183 |
主分类号 |
H01S5/183 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|